We seek an experienced and highly motivated researcher to be involved in research focusing on developing and incorporating STM (Scanning Tunnelling Microscope) based atomically precise lithography with ALE (Atomic Layer Epitaxy) methodologies of deposition and on growing Si structures in 2D and 3D using both solid source and gas source molecular beam epitaxy.
The successful candidate will focus on using the STM in combination with ALE to achieve highly precise silicon growth and the job scope includes proposing, developing and executing research experiments.
Requirements:
A PhD in Physics/ Engineering/ Material Science
At least 3 years of experience in scanning probe microscopy, preferably with experience in working on silicon surface
Experience in molecular beam epitaxy will be an advantage
An independent individual and a good team player
Education Level
Doctorate
Job Function
Scientific Research & Development (R&D)
Hiring Research Institute / Organisation
Institute of Materials Research and Engineering-Singapore
Job Type
Full Time , Contract
We regret that only shortlisted candidates will be notified
